Abstract
Chromium and nickel substituted iron oxide thin films have been deposited by DC sputtering. Films were coated in the thickness range of 130-400 nm, on boro silicate glass and quartz substrates. The films showed transmission as high as 90% in the visible region. The refractive index of the films was 1.6-2.1. The microwave dielectric constant varied as a function of composition from 24 to 12 at frequencies of 8.98 and 11.88 GHz. All the films were X-ray amorphous independent of deposition and post deposition annealing conditions. Surface morphology indicates that roughness is a function of both sputtering pressure as well as inter-electrode distance. © 2006 Elsevier Ltd. All rights reserved.
